Electron beam lithography on non-planar, suspended, 3D AFM cantilever for nanoscale thermal probing

Abstract Electron beam lithography (EBL) on non-planar, suspended, curved or bent surfaces is still one of the most frequently stated problems for fabricating novel and innovative nano-devices sensors future technologies. Although spin coating widespread technique electron resist (e-resist) deposition 2D flat surfaces, it inadequate suspended 3D architectures because its lack uniformity. In this work, we use a thermally evaporated sensitive QSR-5 study sensitivity contrast behaviour using EBL. We show feasibility utilizing patterning objects structures via EBL dry etching processes. demonstrate integration metal any kind thin films at apex an atomic force microscopy (AFM) tip. This showing great potential technology in various fields, such as magnetism, electronic, photonics, phononics other fields related to near field AFM probe like instance scanning thermal microscopy.